Manufacturer: HHV, Bangalore
MFD: 2014-09-01
Model: N/A
Specs: Highly c-axis orientated ZnO (0001) thin film deposition Film thickness upto ~5μm Film deposition rate 0.4μm/hour Wafer size 2”,3” and 4” Substrate rotation 1-20 RPM RF power 600W Pulsed DC power (5-100 kHz) 5kW Magnetron source size 6” diameter Substrate temperature 30-600˚C Best Vacuum >2×10-7 Torr Horizontal sputtering
Charges: For Industry - 18750 /- INR Per Sample
For Student - 9375 /- INR Per Sample
*These are standard charges. Actual charges may vary as per job requirement.
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