
SDS6-ZnO Sputtering System
Manufacturer: HHV, BangaloreMFD: 2014-09-01Model: N/ASpecs: Highly c-axis orientated ZnO (0001) thin film deposition
Film thickness upto ~5μm
Film deposition rate 0.4μm/hour
Wafer size 2”,3” and 4”
Substrate rotation 1-20 RPM
RF power 600W
Pulsed DC power (5-100 kHz) 5kW
Magnetron source size 6” diameter
Substrate temperature 30-600˚C
Best Vacuum >2×10-7 Torr
Horizontal sputtering
Charges: For Industry - 18750 /- INR Per Sample
For Student - 9375 /- INR Per Sample
*These are standard charges. Actual charges may vary as per job requirement.Contacts: