
ES4-Reactive Ion Etching (RIE-STS)
Manufacturer: STS, UKMFD: 1996-01-01Model: N/ASpecs: For poly silicon and silicon dioxide ,silicon nitride etching using CF4, SF6 chemistry. Typical etch rate is 400A0/minCharges: For Industry - 600 /- INR Per Sample
For Student - 300 /- INR Per Sample
*These are standard charges. Actual charges may vary as per job requirement.Contacts: