ES4-Reactive Ion Etching (RIE-STS)

Manufacturer: STS, UK
MFD: 1996-01-01
Model: N/A
Specs: For poly silicon and silicon dioxide ,silicon nitride etching using CF4, SF6 chemistry. Typical etch rate is 400A0/min
Charges: For Industry - 600 /- INR Per Sample
For Student - 300 /- INR Per Sample
*These are standard charges. Actual charges may vary as per job requirement.
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