ES1-Reactive Ion Etching (RIE-Annelva)

Manufacturer: Annelva Corporation, Japan
MFD: 1986-01-01
Model: N/A
Specs: For poly silicon and silicon dioxide ,silicon nitride etching using CF4, SF6 chemistry
Charges: For Industry - 1500 /- INR Per Sample
For Student - 750 /- INR Per Sample
*These are standard charges. Actual charges may vary as per job requirement.
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