
ES1-Reactive Ion Etching (RIE-Annelva)
Manufacturer: Annelva Corporation, JapanMFD: 1986-01-01Model: N/ASpecs: For poly silicon and silicon dioxide ,silicon nitride etching using CF4, SF6 chemistryCharges: For Industry - 1500 /- INR Per Sample
For Student - 750 /- INR Per Sample
*These are standard charges. Actual charges may vary as per job requirement.Contacts: