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Bhoopendra kumar Kushwaha was born in Sonai, Mathura, Uttar Pradesh, India in 1986. He has received Diploma in Electronics Engineering form M.G. Polytechnic, Hathras in 2005, B.Tech in 2009 from UPTU, Lucknow and M.Tech from IIT-BHU, Varanasi in 2019. Mr. Kushwaha joined CSIR-CEERI in 2011 and currently working as a Technical Officer in Semiconductor device Fabrication Facility (SDFF) of CSIR-CEERI Pilani, Rajasthan.
Area of interest: operation and maintenance of Reactive Ion Etching (RIE) system, Metal Organic Chemical vapor deposition (MOCVD) system, Thermal Imaging and Dicing System.